Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...
A newly revealed patent from Chinese lithography systems maker Shanghai Micro Electronics Equipment (SMEE) shows how domestic firms could progress in the local advanced lithography tools market ...
While newer technologies like extreme ultraviolet (EUV) lithography machines are used to produce the most advanced chips. Xiang Ligang, director-general of the Information Consumption Alliance ...