Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

Corning introduces new Extreme ULE glass for photomasks and mirrors to be used with next-generation EUV and High-NA EUV tools ...

Recent advancements in light-based lithography, including EUVL, have significantly improved semiconductor manufacturing.

A new technical paper titled “Resolution enhancement for high-numerical aperture extreme ultraviolet lithography by split ...

ASML Holding plunged following a lower-than-expected forecast for 2025 due in part to tighter export controls in the ...

Corning designed EXTREME ULE ® Glass to withstand the highest intensity extreme ultraviolet (EUV) lithography, including high numerical aperture (High NA) EUV, which is rapidly becoming an industry ...

The lithography machines ... DUV machines also lag behind extreme ultraviolet (EUV) machines, which use light with a wavelength of just 13.5nm – almost 14 times sharper than DUV’s 195nm.

While newer technologies like extreme ultraviolet (EUV) lithography machines are used to produce the most advanced chips. Xiang Ligang, director-general of the Information Consumption Alliance ...

A newly revealed patent from Chinese lithography systems maker Shanghai Micro Electronics Equipment (SMEE) shows how domestic firms could progress in the local advanced lithography tools market ...

[Photo/Agencies] Following its earlier decision to stop exporting state-of-the-art extreme ultraviolet lithography systems to China, the Dutch government announced on Friday it would expand those ...

Sara Russo, an analyst from Bernstein, maintained the Buy rating on ASML Holding NV (0QB8 – Research Report). The associated price target ...