The solution — liquid tin targets — is not directly transferable to rare-earth materials because of their high melting points. In parallel with the development of EUV lithography at 13.5 nm ...
A Chinese company has achieved a game-changing breakthrough in photoresist, a key material for semiconductor lithography machines, successfully passing mass production tests, according to officials ...
DUV lithography machines are used to manufacture ... especially in cutting-edge semiconductor making equipment and fundamental chip materials, Sheng said, adding that "some advanced chip packaging ...