The solution — liquid tin targets — is not directly transferable to rare-earth materials because of their high melting points. In parallel with the development of EUV lithography at 13.5 nm ...

A Chinese company has achieved a game-changing breakthrough in photoresist, a key material for semiconductor lithography machines, successfully passing mass production tests, according to officials ...

In fact, materials with a refractive index up to 2.1 for 193 nm do exist (Table 1), the problem is that they are not of a quality required for lithography and almost all of them suffer from a ...

Recent advancements in light-based lithography, including EUVL, have significantly improved semiconductor manufacturing.

Corning introduces new Extreme ULE glass for photomasks and mirrors to be used with next-generation EUV and High-NA EUV tools ...

Also, Canon will need to collaborate with other companies to create materials compatible with this new lithography method, which will be essential for widespread industry use. Finally, NIL is ...

A newly revealed patent from Chinese lithography systems maker Shanghai Micro Electronics Equipment (SMEE) shows how domestic firms could progress in the local advanced lithography tools market ...

The Lithography Book is located in the player ... Rewards will come in many forms, such as new lithographs and materials of varying rarity. It is recommended that players only pursue the rewards ...